Diagnostics for laser plasma EUV sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5580, Issue , 2005, Pages 434-442

  Richardson, M ^a   Koay, C S ^a   Takenoshita, K ^a   Keyser, C ^a,b   Bernath, R ^a   George, S ^a   Teerawattansook, S ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

EUV diagnostics; EUV sources; Laser plasma

Indexed keywords

COMPUTER CHIPS; EUV DIAGNOSTICS; EUV SOURCES; LASER PLASMA;

DATA ACQUISITION; IMAGING TECHNIQUES; LIGHT SOURCES; MEASUREMENT THEORY; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY; PLASMA APPLICATIONS; SECOND HARMONIC GENERATION;

LASER DIAGNOSTICS;

EID: 23244451441     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.597349     Document Type: Conference Paper

References (32)

1. F. Schellenberg: Proc. SPIE, v. 5377, xix (2004)
2. Y. Watanabe et al, "Joint requirement", EUV Source Workshop, Feb 2004, available at http://www.sematech.org
3. R.L. Kauffman, D.W. Phillion, and R.C. Spitzer, "X-ray production ∼13nm from laser-produced plamsama for projection x-ray lithography applications," Appl. Opt. 32, 6897-6900 (1993)
4. R. C. Spitzer, T.J. Orzechowski, D.W. Phillion, R.L. Kauffman, and C. Cerjan, "Conversion efficiencies from laser-produced-plasma in the extreme ultraviolet regime," J. Appl. Phys., 79, pp. 2251-2253 (1996
5. F. Jin, "Advanced laser plasma EUV source", a PhD thesis at Univ. of Central Florida (1995)
6. "New laser plasma source for extreme-ultraviolet lithography", F. Jin and M. Richardson, Applied Optics, Vol. 34, No. 25, pp. 5750-5760, September 1995.
7. "Water laser plasma x-ray point source and apparatus", by M. Richardson, M. Kado, K. Gabel & F. Jin, Patent No. 5,459,771, October 1995
8. D.A. Tichenor et al,"Diffraction-limited soft-x-ray projection imaging using a laser plasma source", Opt. Lett. 16, 557 (1991)
9. "Cluster Beam Targets for Laser Plasma Extreme Ultraviolet and Soft X-ray Sources", Glenn D. Kublak and Martin Richardson, Patent No. 5,577,092, November 1996.
10. W. Svendsen and G. O'Sullivan, "Statistics and characteristics of xuv transition arrays from laser-produced plasmas of the elements tin through iodine," Phys. Rev. A, 50, 3710-3718 (1994)
11. G. M. Zeng, H. Daido, K. Murai, M. Nakatsuka, and S. Nakai, "Line x-ray emissions from highly ionized plasmas of various species irradiated by a compact solid-state lasers," J. Appl. Phys. 72, 3355-3362 (1992)
12. B.A.M. Hansson, L. Rymel, M. Berglund, and H.M. Hertz, "A liquid-xenon-jet laser-plasma X-ray and EUV source", Microelectronic Eng. 53, 667-670 (2000)
13. H. Shields et al., "Xenon target performance characteristics for laser-produced plasma EUV sources," Proc. SPIE, vol. 4688, 94 (2002)
14. M. Richardson et al, "High conversion efficiency mass-limited-Sn-based laser-plasma source for EUV Lithography", Proc. 46th Int. Conf. on EIPBN (2003)
15. R. Benattar, C. Popovics, R. Sigel: Rev. Sci. Instr. 50 (12), 1583 (1979)
16. U. Kogelschatz: Appl. Opt. 13(8), 1749 (1974)
17. I. Hutchinson: Principles of Plasma Diagnostics, (Cambridge University Press, 1992) pp. 112-115
18. http://optics.tu-graz.ac.at/
19. J. Tawney, M. Richardson, R. Adhav: To be published
20. M. Kroon, R. Stuik, "Luminescent Materials for EUV Detection Purposes", SPIE, Vol. 4343, 665, (2001)
21. S.A. vd Westen et al, "Flying Circus 2: Calibration of an Extreme Ultraviolet Source at PLEX LLC," International SEMATECH Technology Transfer #04024490A-TR (2004), available at http://www.sematech.org
22. N. Ceglio, A. Hawryluk, and R. Price, Lawrence Livermore Laboratory, report UCRL-86471, 1982. (unpublished)
23. M. Schattenburg, H. Anderson, and H. Smith, Phys. Scr. 41, 13 (1990).
24. J. Weaver et al, Rev. Sci. Instrum. 72, 108 (2001).
25. M. Schattenburg, H. Anderson, and H. Smith, Phys. Scr. 41, 13 (1990).
26. J. Weaver et al., Rev. Sci. Instrum. 72, 108 (2001).
27. T. Kita, T. Harada, N. Nakano, and H. Kuroda, Appl. Opt. 22, 512 (1983)
28. W. Schwanda, K. Eidmann, and M. Richardson, J. X-Ray Sci Tech. 4, 1 (1993).
29. X-ray CCD camera model: PI-SX:512 from Princeton Instrument
30. International Radiation Detection (California, USA)
31. determined from tables at the CXRO website, http://www.cxro.lbnl.gov
32. K.Takenoshita et al, "Debris studies for the tin-based droplet laser-plasma EUV source," Proc. SPIE, vol 5374, pp. 954-963 (2004)