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Journal of Electronic Materials

Volumn 37, Issue 5, 2008, Pages 755-759

ZnO thin film, device, and circuit fabrication using low-temperature PECVD processes

(4) Sun, Jie a Mourey, Devin A b Zhao, Dalong a Jackson, Thomas N a

a The Pennsylvania State University (United States)

b PENNSYLVANIA STATE UNIVERSITY (United States)

Author keywords

In situ deposition; Plasma chemical vapor deposition (PECVD); Ring oscillators; Thin film transistors (TFTs)

Indexed keywords

CIRCUIT FABRICATION; GATE LEAKAGE; IN SITU DEPOSITION; RING OSCILLATORS;

ELECTRIC INVERTERS; MICROFABRICATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ZINC OXIDE;

THIN FILMS;

EID: 42249092339 PISSN: 03615235 EISSN: None Source Type: Journal
DOI: 10.1007/s11664-007-0362-7 Document Type: Conference Paper

Times cited : (31)

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