Measuring and tailoring CTE within ULE® glass

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 227-235

  Hrdina, Kenneth E ^a   Ackerman, Bradford G ^a   Fanning, Andrew W ^a   Heckle, Christine E ^a   Jenne, David C ^a   Navan, W David ^a  

^a Semiconductor Optics Division ^*  (United States)

Author keywords

Cross over temperature; CTE; EUVL; Homogeneity; Interferometer; Metrology; Optics; Photomasks; Thermal expansion; ULE

Indexed keywords

GLASS; INTERFEROMETERS; NONDESTRUCTIVE EXAMINATION; OPTICS; TEMPERATURE; THERMAL EXPANSION; VARIATIONAL TECHNIQUES;

COEFFICIENT OF THERMAL EXPANSION; EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTOMASKS;

LITHOGRAPHY;

EID: 0141836121     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484925     Document Type: Conference Paper

References (20)

1. K. Hrdina, D. Brewer, and S. Kenney, "Inclusions Within ULE® Glass," 2nd International Workshop on EUV Lithography, San Francisco, CA, 19-21 Oct 2000.
2. Kenneth E. Hrdina, Benjamin Z. Hanson, Philip M. Fenn and Robert Sabia, "Characterization and Characteristics of a ULE® Glass Tailored for the EUVL Needs," Proceedings of SPIE 27th Annual Microlithography Symposium, 4688 March 3-8, 2002.
3. C. Heckle, K. Hrdina, B. Ackerman and D. Navan, "Development of Mask Materials for EUVL," 22nd Annual Bacus Symposium on Photomasks, 1113-1120, 4889, 2002.
4. K. Hrdina, C. Hamilton, and S. Kenney, "A Recent Look at CTE in ULE® Glass," 2nd International Workshop on EUV Lithography, San Francisco, CA, 19-21 Oct 2000.
5. G. Meda, "Reflecting-Surface Distortion When Mirrors are Cut to Shape," Proceedings of SPIE 26th Annual Symposium ML, 4343 March 2001.
6. S. Roux, G. Meda, and P. Spence, "Applicability of ULE® Glass for EUVL," 2nd International Workshop on EUV Lithography, San Francisco, CA, 19-21 Oct 2000.
7. J. Shaffer and H. Bennett, "Effect of Thermal Cycling on Dimensional Stability of Zerodur and ULE," Applied Optics, 23 [17] 2852-2853, September 1, 1984.
8. S. Jacobs, S. Johnston, J. Sasian, M. Watson, J. Targrove, and D. Bass, "Surface Figure Changes Due to Thermal Cycling Hysteresis," Applied Optics, 26 [20] Oct. 15, 1987.
9. J. Pepi and D. Golini, "Delayed Elastic Effects in the Glass Ceramic Zerodur and ULE at Room Temperature," Applied Optics, 30 [22], 3087-3088 Aug 1, 1991.
10. S. Wilkins, D. Coon and J. Epstein, "Elastic Hysteresis Phenomena in ULE and Zerodur Optical Glasses at Elevated Temperatures," SPIE, 970, 40-46, 1988.
11. S. Gulati and M. Edwards, "ULE-Zero Expansion, Low Density, and Dimensionally Stable Material for Lightweight Optical Systems," CR67 July 27-28, 1997.
12. S.E. Gianoulakis, and A.K. Ray-Chaudhuri, "Thermal-Mechanical Performance of Extreme Ultraviolet Lithographic Reticles," J. Vac.Sci.Technologies, B16 [6], pp. 3440-3443, 1998.
13. S.E. Gianoulakis, A.K. Ray-Chaudhuri and S.D. Hector, "Thermal Management of EUV lithography Masks Using Low Expansion Glass Substrates," Proceedings of the 1999 SPIE Symposium on Emerging Lithographic Technologies III, 3676, pp598-605, 1999
14. C.J. Martin, R.L. Engelstad, E.G. Lovell, "Theromechanical Modeling of the EUV Reticle During Exposure," SPIE Emerging Lithographic Technologies V, 4343, pp515-523, 2001.
15. P. Schultz and H. Smyth, "Ultra-Low-Expansion Glasses and Their Structure in the SiO2-TiO2 System," from Amorphous Materials, ed. By Douglas and Ellis, Wiley, NY, 453-461, 1970.
16. G. Sommargren, M. Johnston, K. Blaedel, D. Phillion, J. Taylor and L. Bradsher, "Characterizing the Flatness, Wedge, & Homogeneity of EUVL Mask Substrates," 1st Internation Symposium on EUVL Lithography, Dallas, Oct. 2002.
17. H. Hagy, "The Trident Seal - A Rapid and Accurate Expansion Differential Test," J. Am. Ceram. Soc. 62, pp. 60-62, 1979.
18. H. Hagy, "High Precision Photoelastic and Ultrasonic Techniques for Determining Absolute and Differential Thermal Expansion of Titania-Silica Glasses," Applied Optics, 12 [7], 1440-1446, July 1973.
19. H. Hagy and W. Shirkey, "Determining Absolute Thermal Expansion of Titania-Silica Glasses: A Refined Ultrasonic Method," Applied Optics, 14 [9], 2099-2103 September 1975.
20. M. Edwards, E. Bullock, and D. Morton, "Improved Precision of Absolute Thermal Expansion Measurements for ULE® Glass," SPIE Proceedings, Advanced Materials for Optics and Precision Structures, Denver, Colorado 58-63, 2867 August 8, 1996.