Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Philipsen, Vicky ^a   Mesuda, Kei ^b   De Bisschop, Peter ^a   Erdmann, Andreas ^c   Citarella, Giuseppe ^c   Evanschitzky, Peter ^c   Birkner, Robert ^d   Richter, Rigo ^d   Scherübl, Thomas ^d  

^a IMEC   (Belgium)

^b DAI NIPPON PRINTING CO LTD   (Japan)

^c FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^d CARL ZEISS SMT AG   (Germany)

Author keywords

Alternative mask stacks; Hyper NA lithography; Mask 3D effects; Rigorous simulations; Wafer evaluation

Indexed keywords

ELECTROMAGNETIC FIELD EFFECTS; IMAGE ENHANCEMENT; IMAGE RESOLUTION; PHASE SHIFT; THREE DIMENSIONAL;

ALTERNATIVE MASK STACKS; DEPTH-OF-FOCUS (DOF); HYPER-NA LITHOGRAPHY; MANUFACTURABILITY; MASK QUALITY; RIGOROUS SIMULATIONS; WAFER EVALUATION;

MASKS;

EID: 42149119189     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746678     Document Type: Conference Paper

References (9)

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