Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Yoshizawa, Masaki ^a,b   Philipsen, Vicky ^b   Leunissen, Leonardus H A ^b  

^a SONY CORPORATION   (Japan)

^b IMEC   (Belgium)

Author keywords

Absorber thickness; Attenuating phase shifting mask; Hyper NA; Immersion; Mask topography

Indexed keywords

DIFFRACTION; IMAGING TECHNIQUES; LITHOGRAPHY; OPTIMIZATION; POLARIZATION;

ABSORBER THICKNESS; ATTENUATING PHASE-SHIFTING MASK; ATTENUATING PHASE-SHIFTING MASK (ATTPSM); CRITICAL DIMENSION (CD); HYPER NA; IMMERSION; MASK TOPOGRAPHY;

MASKS;

EID: 33745769037     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659823     Document Type: Conference Paper

References (10)

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