Using the AIMS™ 45-193i for hyper-NA imaging applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  De Bisschop, Peter ^a   Philipsen, Vicky ^a   Birkner, Robert ^b   Buttgereit, Ute ^b   Richter, Rigo ^b   Scherübl, Thomas ^b  

^a IMEC   (Belgium)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

AIMS; Hyper NA imaging; OPC; Vector effect emulation

Indexed keywords

ANGLE MEASUREMENT; IMAGING SYSTEMS; LIGHT POLARIZATION; LITHOGRAPHY; VECTORS; WAFER BONDING;

OPTICAL PROXIMITY CORRECTION (OPC); RETICLE INSPECTION TOOLS; VECTOR EFFECT EMULATION; WAFER FAB;

OPTICAL SYSTEMS;

EID: 42149159066     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746688     Document Type: Conference Paper

References (6)

1. TM: Trademark of Carl Zeiss.
2. R.A. Budd et al., "Development and Application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS",. IBM J. Res. Develop. 41(1,2) January / March 1997
3. A. Zibold et al., "First results for hyper NA scanner emulation from AIMS™45 - 193i", Photomask and Next-Generation Lithography Mask technology XIII (PMJ), Proc. of SPIE Vol. 6283 (2006) 628312-1
4. rd European Mask and Lithography Conference (EMLC), Proc. of SPIE Vol. 6533 (2007) 653309-1
5. T. Konishi, Y. Kojima, V. Philipsen, P. Leunissen, L. Van Look, "Through-pitch and through-focus characterization of AAPSM for ArF immersion lithography", Proc. of SPIE Vol. 6281, (2006)
6. OPC-software has already been used for automatic generation of AIMS™ inspection sites. See: G. Davis, S.Y. Choi, E.H. Chung, A. Seyfarth, H. van Doornmalen, E. Poortinga, "Automated aerial image based CD metrology initiated by pattern marking with photomask layout data", Photomask and Next-Generation Lithography Mask technology XIV (PMJ), Proc. of SPIE Vol. 6607 (2007) 60072A 1-10