The impact of the mask stack and its optical parameters on the imaging performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Erdmann, Andreas ^a   Fühner, Tim ^a   Seifert, Sebastian ^a   Popp, Stephan ^a   Evanschitzky, Peter ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Lithography simulation; Mask materials; Mask topography; Polarization

Indexed keywords

ELECTROMAGNETIC FIELD EFFECTS; ERROR ANALYSIS; OPTIMIZATION; PHOTOLITHOGRAPHY; POLARIZATION;

LITHOGRAPHY SIMULATION; MASK MATERIALS; MASK TOPOGRAPHY;

MASKS;

EID: 35148877289     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.709351     Document Type: Conference Paper

References (13)

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