Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Yoshizawa, Masaki ^a,b   Philipsen, Vicky ^b   Leunissen, Leonardus H A ^b   Hendrickx, Eric ^b   Jonckheere, Rik ^b   Vandenberghe, Geert ^b   Buttgereit, Ute ^c   Becker, Hans ^c   Koepernik, Corinna ^d   Irmscher, Mathias ^d  

^a SONY CORPORATION   (Japan)

^b IMEC   (Belgium)

^c Schott Lithotec AG   (Germany)

^d Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

Hyper NA lithography; Immersion; Mask topography; Phase shift mask; Polarization

Indexed keywords

HYPER-NA LITHOGRAPHY; IMMERSION; MASK TOPOGRAPHY; PHASE SHIFT MASK; HYPER NA LITHOGRAPHY;

COMPUTER SIMULATION; ELECTROMAGNETIC FIELD EFFECTS; ELECTROMAGNETIC WAVE POLARIZATION; IMAGE QUALITY; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; SILICA; ATTENUATION; IMAGING SYSTEMS; INTEGRATED CIRCUITS; PHASE SHIFT; POLARIZATION;

MASKS;

EID: 33748043655     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681883     Document Type: Conference Paper

References (12)

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