-
1
-
-
33748033778
-
-
TM: Trademark of Carl Zeiss
-
TM: trademark of Carl Zeiss
-
-
-
-
2
-
-
0030709847
-
Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System
-
2 January/ March
-
R.A. Budd, D.B. Dove, J.L. Staples, R.M. Martino, R.A. Furguson, J.T. Weed. Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS. IBM J. Res. Develop. Vol 41 No. 1,2 January/ March, 1997.
-
(1997)
AIMS. IBM J. Res. Develop.
, vol.41
, Issue.1
-
-
Budd, R.A.1
Dove, D.B.2
Staples, J.L.3
Martino, R.M.4
Furguson, R.A.5
Weed, J.T.6
-
3
-
-
0001549901
-
A new tool for phase shift mask evaluation, the stepper equivalent aerial image measurement system AIMS
-
R.A. Budd, J. Staples and D. B. Dove. A New Tool for Phase Shift Mask Evaluation, the Stepper Equivalent Aerial Image Measurement System AIMS. Proceedings of SPIE Vol. 2087, 1993.
-
(1993)
Proceedings of SPIE
, vol.2087
-
-
Budd, R.A.1
Staples, J.2
Dove, D.B.3
-
4
-
-
20044362134
-
Aerial image measurement technique for today's and future 193nm lithography mask requirements
-
A.M. Zibold, T. Scherübl, A. Menck, R. Brunner, J. Greif. Aerial Image Measurement Technique for Today's and Future 193nm Lithography Mask Requirements. Proceedings of 20th EMC Conference, 2004.
-
(2004)
Proceedings of 20th EMC Conference
-
-
Zibold, A.M.1
Scherübl, T.2
Menck, A.3
Brunner, R.4
Greif, J.5
-
5
-
-
11844258284
-
Aerial image measurement technique for Automated Reticle Defect Disposition (ARDD) in wafer fabs
-
A.M. Zibold, R. Schmid, B. Stegemann, T. Scheruebl, W. Harnisch, Y. Kobiyama. Aerial image measurement technique for Automated Reticle Defect Disposition (ARDD) in wafer fabs. Proceedings of SPIE Vol. 5446-117, 2004.
-
(2004)
Proceedings of SPIE
, vol.5446
, Issue.117
-
-
Zibold, A.M.1
Schmid, R.2
Stegemann, B.3
Scheruebl, T.4
Harnisch, W.5
Kobiyama, Y.6
-
6
-
-
24644455971
-
Advances in hardware, software and automation for 193nm aerial image measurement systems
-
A.M. Zibold, R. Schmid, A. Seyfarth, M. Wächter, W. Harnisch, H.v. Doornmalen. Advances in hardware, software and automation for 193nm aerial image measurement systems. Proceedings of SPIE Vol. 5752-114, 2004.
-
(2004)
Proceedings of SPIE
, vol.5752
, Issue.114
-
-
Zibold, A.M.1
Schmid, R.2
Seyfarth, A.3
Wächter, M.4
Harnisch, W.5
Doornmalen, H.V.6
-
7
-
-
20044391098
-
Using the aerial image measurement technique to speed up mask development for 193nm immersion and polarisation lithography
-
A. Zibold, W. Harnisch, T. Scherübl, N. Rosenkranz, J. Greif. Using the aerial image measurement technique to speed up mask development for 193nm immersion and polarisation lithography. Proceedings of SPIE Vol. 5645-30, 2004.
-
(2004)
Proceedings of SPIE
, vol.5645
, Issue.30
-
-
Zibold, A.1
Harnisch, W.2
Scherübl, T.3
Rosenkranz, N.4
Greif, J.5
-
8
-
-
28544442727
-
Advances with the new AIMS™ fab 193 2nd generation: A system for the 65 nm node including immersion
-
A. M. Zibold, E. Poortinga, H.v. Doornmalen, R. Schmid, T. Scherübl, W. Harnisch. Advances with the new AIMS™ fab 193 2nd generation: A system for the 65 nm node including immersion. Proceedings of SPIE Vol. 5853-131, 2005.
-
(2005)
Proceedings of SPIE
, vol.5853
, Issue.131
-
-
Zibold, A.M.1
Poortinga, E.2
Doornmalen, H.V.3
Schmid, R.4
Scherübl, T.5
Harnisch, W.6
-
9
-
-
33745604246
-
An advanced study for defect disposition through 193nm aerial imaging
-
A. Dürr, A. Zibold, K. Böhm. An advanced study for defect disposition through 193nm aerial imaging. Proceedings of SPIE Vol. 6152-102, 2006.
-
(2006)
Proceedings of SPIE
, vol.6152
, Issue.102
-
-
Dürr, A.1
Zibold, A.2
Böhm, K.3
-
10
-
-
33745598811
-
Printability study with polarisation capable AIMS™ fab 193i to study polarisation effects
-
A. Zibold, U. Stroessner, A. Ridley, T. Scherübl, N. Rosenkranz, W. Harnisch, E. Poortinga, R. Schmid, J. Bekaert, V. Philipsen, L.van Look, P. Leunissen. Printability study with polarisation capable AIMS™ fab 193i to study polarisation effects. Proceedings of SPIE Vol. 6152-92, 2006.
-
(2006)
Proceedings of SPIE
, vol.6152
, Issue.92
-
-
Zibold, A.1
Stroessner, U.2
Ridley, A.3
Scherübl, T.4
Rosenkranz, N.5
Harnisch, W.6
Poortinga, E.7
Schmid, R.8
Bekaert, J.9
Philipsen, V.10
Look, L.V.11
Leunissen, P.12
-
11
-
-
33748085782
-
45nm imaging capability of various PSM technologies using polarization
-
W. Conley, L. C. Litt, E. Poortinga, A. Zibold, B. S. Kasprowicz, M. Cangemi, N. Morgana. 45nm imaging capability of various PSM technologies using polarization. Proceedings of SPIE Vol. 6152, 2006.
-
(2006)
Proceedings of SPIE
, vol.6152
-
-
Conley, W.1
Litt, L.C.2
Poortinga, E.3
Zibold, A.4
Kasprowicz, B.S.5
Cangemi, M.6
Morgana, N.7
-
12
-
-
3843077389
-
Exploring the capabilities of immersion lithography through simulation
-
C.A. Mack and J.D. Byers. Exploring the Capabilities of Immersion Lithography Through Simulation. Proceedings of SPIE Vol. 5377, 2004.
-
(2004)
Proceedings of SPIE
, vol.5377
-
-
Mack, C.A.1
Byers, J.D.2
-
13
-
-
3843136104
-
An. Estroff. Benefiting from polarisation - Effects on high-NA imaging
-
B. W. Smith, L. Zavyalova, An. Estroff. Benefiting from polarisation - effects on high-NA imaging. Proceedings of SPIE Vol. 5377-04, 2005.
-
(2005)
Proceedings of SPIE
, vol.5377
, Issue.4
-
-
Smith, B.W.1
Zavyalova, L.2
-
14
-
-
0001695563
-
On a remarkable case of uneven distribution of light in a diffraction grating spectrum
-
R. W. Wood. On a remarkable case of uneven distribution of light in a diffraction grating spectrum. Phil. Mag. 4, 1902.
-
(1902)
Phil. Mag.
, vol.4
-
-
Wood, R.W.1
-
15
-
-
25144474879
-
Investigation of Polarisation Effects on new Mask Materials
-
Karsten Bubke, Silvio Teuber, Ingo Hoellein, Hans Becker, Holger Seitz, Ute Buttgereit. Investigation of Polarisation Effects on new Mask Materials. Proceedings of SPIE Vol. 5754-55, 2005.
-
(2005)
Proceedings of SPIE
, vol.5754
, Issue.55
-
-
Bubke, K.1
Teuber, S.2
Hoellein, I.3
Becker, H.4
Seitz, H.5
Buttgereit, U.6
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