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Volumn 6283 I, Issue , 2006, Pages

First results for hyper NA scanner emulation from AIMS™ 45-193i

Author keywords

Aerial image; AIMS; High NA; Hyper NA; Immersion; Numerical aperture; Polarisation; TE; TM; Vector effects

Indexed keywords

IMAGING SYSTEMS; LIGHT POLARIZATION; MASKS; SCANNING; SEMICONDUCTOR DEVICES;

EID: 33748056826     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681863     Document Type: Conference Paper
Times cited : (29)

References (15)
  • 1
    • 33748033778 scopus 로고    scopus 로고
    • TM: Trademark of Carl Zeiss
    • TM: trademark of Carl Zeiss
  • 2
    • 0030709847 scopus 로고    scopus 로고
    • Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System
    • 2 January/ March
    • R.A. Budd, D.B. Dove, J.L. Staples, R.M. Martino, R.A. Furguson, J.T. Weed. Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS. IBM J. Res. Develop. Vol 41 No. 1,2 January/ March, 1997.
    • (1997) AIMS. IBM J. Res. Develop. , vol.41 , Issue.1
    • Budd, R.A.1    Dove, D.B.2    Staples, J.L.3    Martino, R.M.4    Furguson, R.A.5    Weed, J.T.6
  • 3
    • 0001549901 scopus 로고
    • A new tool for phase shift mask evaluation, the stepper equivalent aerial image measurement system AIMS
    • R.A. Budd, J. Staples and D. B. Dove. A New Tool for Phase Shift Mask Evaluation, the Stepper Equivalent Aerial Image Measurement System AIMS. Proceedings of SPIE Vol. 2087, 1993.
    • (1993) Proceedings of SPIE , vol.2087
    • Budd, R.A.1    Staples, J.2    Dove, D.B.3
  • 7
    • 20044391098 scopus 로고    scopus 로고
    • Using the aerial image measurement technique to speed up mask development for 193nm immersion and polarisation lithography
    • A. Zibold, W. Harnisch, T. Scherübl, N. Rosenkranz, J. Greif. Using the aerial image measurement technique to speed up mask development for 193nm immersion and polarisation lithography. Proceedings of SPIE Vol. 5645-30, 2004.
    • (2004) Proceedings of SPIE , vol.5645 , Issue.30
    • Zibold, A.1    Harnisch, W.2    Scherübl, T.3    Rosenkranz, N.4    Greif, J.5
  • 9
    • 33745604246 scopus 로고    scopus 로고
    • An advanced study for defect disposition through 193nm aerial imaging
    • A. Dürr, A. Zibold, K. Böhm. An advanced study for defect disposition through 193nm aerial imaging. Proceedings of SPIE Vol. 6152-102, 2006.
    • (2006) Proceedings of SPIE , vol.6152 , Issue.102
    • Dürr, A.1    Zibold, A.2    Böhm, K.3
  • 12
    • 3843077389 scopus 로고    scopus 로고
    • Exploring the capabilities of immersion lithography through simulation
    • C.A. Mack and J.D. Byers. Exploring the Capabilities of Immersion Lithography Through Simulation. Proceedings of SPIE Vol. 5377, 2004.
    • (2004) Proceedings of SPIE , vol.5377
    • Mack, C.A.1    Byers, J.D.2
  • 13
    • 3843136104 scopus 로고    scopus 로고
    • An. Estroff. Benefiting from polarisation - Effects on high-NA imaging
    • B. W. Smith, L. Zavyalova, An. Estroff. Benefiting from polarisation - effects on high-NA imaging. Proceedings of SPIE Vol. 5377-04, 2005.
    • (2005) Proceedings of SPIE , vol.5377 , Issue.4
    • Smith, B.W.1    Zavyalova, L.2
  • 14
    • 0001695563 scopus 로고
    • On a remarkable case of uneven distribution of light in a diffraction grating spectrum
    • R. W. Wood. On a remarkable case of uneven distribution of light in a diffraction grating spectrum. Phil. Mag. 4, 1902.
    • (1902) Phil. Mag. , vol.4
    • Wood, R.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.