Adding grayscale layer to chrome photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Poon, David K ^a   Dykes, James M ^a   Choo, Chinheng ^a   Tsui, Jimmy T K ^a   Wang, Jun ^a   Chapman, Glenn H ^a   Tu, Yuqiang ^b   Reynolds, Patrick ^b   Zanzal, Andrew ^b  

^a SIMON FRASER UNIVERSITY   (Canada)

^b Benchmark Technologies   (United States)

Author keywords

3D MEMS; Analog grayscale photomask; Chrome photomask; Direct write photomask; Grayscale photomask

Indexed keywords

BIMETALS; LITHOGRAPHY; METALLIC FILMS; MICROELECTROMECHANICAL DEVICES; THIN FILMS; TRANSPARENCY;

ANALOG GRAYSCALE PHOTOMASKS; CHROME PHOTOMASKS; DIRECT-WRITE PHOTOMASK; GRAYSCALE PHOTOMASKS;

MASKS;

EID: 33846600496     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686599     Document Type: Conference Paper

References (9)

1. G. H. Chapman, Y. Tu, M. V. Sarunic, "BiIn: a Sensitive Bimetallic Thermal Resist", Proc. SPIE Vol. 4345, pp 557-568, 2001.
2. G.H. Chapman, Y. Tu, and M. V. Sarunic, " Bi/In Bimetallic Thermal Resists for Microfabrication, Photomasks and Micromachining Applications", Proc. SPIE Vol. 4690, pp 465-476, San Jose, CA, Mar., 2002.
3. C.M. Waits, R Ghodssi, M.H. Ervin, M. Dubey, "MEMS-based Gray-Scale Lithography", Semiconductor Device Research Symposium, International 2001, pp 182, 2001.
4. T. Dillon, A. Sure, J. Murakowski, D. Prather, "Continuous-tone grayscale mask fabrication using high-energy-beam-sensitive glass", J. Microlith., Microfab., Microsyst., Vol. 3 No. 4, pp 550, Oct. 2004.
5. G.H. Chapman, Y. Tu, J. M. Dykes, M. Mio and J. Peng, "Creating Direct-write Grayscale Photomasks with Bimetallic Thin Film Thermal Resists", SPIE Proc. 5256, pp 400-411, 2003.
6. Y. Tu, G. H. Chapman, J. M. Dykes, D. Poon, C. Choo, J. Peng, "Calibrating Grayscale Direct Write Bimetallic Photomasks to Create 3D photoresist structures", SPIE Proc. 5567, pp 245-256, 2004.
7. G. H. Chapman and Y. Tu, "Single step direct-write photomask made from bimetallic Bi/In thermal resist", SPIE Proc. Vol. 4977, pp 257-268, 2003.
8. Y. Tu, G. H. Chapman, "Bi/In as Patterning and Masking Layers for Alkaline-Base Si Anisotropic Etching", SPIE Photonics West 2003, Micromachining and Microfabrication Process Technology VII, v 4979, pg 87-98, San Jose, CA, Jan 2003.
9. G.H. Chapman, D. Poon, C. Choo, Y. Tu, J. Dykes, J. Wang, J. Peng, W. Lennard and K. Kavanagh, "Enhanced Inorganic Bimetallic Thermal Resists Transparency and Resolution for Photomask Fabrication", Proc. SPIE v.5753, pp. 976-987, 2005.