Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials

Review of Scientific Instruments

Volumn 71, Issue 8, 2000, Pages 3173-3177

  Mori, Y ^a   Yoshii, K ^a   Kakiuchi, H ^a   Yasutake, K ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012040379     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1305510     Document Type: Review

References (8)

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