|
Volumn 46, Issue 45-49, 2007, Pages
|
Recessed slant gate AlGaN/GaN high electron mobility transistors with 20.9 W/mm at 10 GHz
|
Author keywords
Gallium nitride; High electron mobility transistor (HEMT); Power measurements; Recess; Slant gate
|
Indexed keywords
ELECTRIC CONDUCTIVITY;
ELECTRIC FIELDS;
ELECTRON MOBILITY;
GALLIUM ALLOYS;
GALLIUM COMPOUNDS;
GALLIUM NITRIDE;
IONIZATION OF GASES;
NITRIDES;
SEMICONDUCTING GALLIUM;
TRANSISTORS;
ALGAN/GAN HIGH ELECTRON MOBILITY TRANSISTORS;
BREAKDOWN VOLTAGES;
DRAIN BIASSED;
ELECTRIC-FIELD;
GATE LEAKAGES;
GATE PROCESSING;
HIGH ELECTRON MOBILITY TRANSISTOR (HEMT);
POWER DENSITIES;
POWER MEASUREMENTS;
RECESS;
SLANT GATE;
HIGH ELECTRON MOBILITY TRANSISTORS;
|
EID: 41749096824
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.46.L1087 Document Type: Article |
Times cited : (55)
|
References (12)
|