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Volumn 90, Issue 6, 2002, Pages 1022-1031

AlGaN/GaN HEMTs - An overview of device operation and applications

Author keywords

Gallium nitride; High electron mobility transistor (HEMts); MMICs; Polarization

Indexed keywords

ALUMINUM ALLOYS; BAND STRUCTURE; GALLIUM NITRIDE; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; POLARIZATION; RADAR; SEMICONDUCTOR MATERIALS;

EID: 0001473741     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2002.1021567     Document Type: Article
Times cited : (1864)

References (13)
  • 1
    • 0023040588 scopus 로고
    • Metalorganic vapor phase epitaxial growth of high quality GaN film using an AlN buffer layer
    • Feb.
    • H. Amano, N. Sawaki, I. Akasaki, and Y. Toyoda, "Metalorganic vapor phase epitaxial growth of high quality GaN film using an AlN buffer layer," Appl. Phys. Lett., vol. 48, no. 5, pp. 353-355, Feb. 1986.
    • (1986) Appl. Phys. Lett. , vol.48 , Issue.5 , pp. 353-355
    • Amano, H.1    Sawaki, N.2    Akasaki, I.3    Toyoda, Y.4
  • 2
    • 33751127103 scopus 로고
    • GaN thin films deposited via organometallic vapor phase epitaxy on alpha (6H)-SiC(0001) using high-temperature monocrystalline AIN buffer layers
    • July
    • T. W. Weeks, Jr., M. D. Bremser, K. S. Ailey, E. Carlson, W. G. Perry, and R. F. Davis, "GaN thin films deposited via organometallic vapor phase epitaxy on alpha (6H)-SiC(0001) using high-temperature monocrystalline AIN buffer layers," Appl. Phys. Lett., vol. 67, pp. 401-403, July 1995.
    • (1995) Appl. Phys. Lett. , vol.67 , pp. 401-403
    • Weeks Jr., T.W.1    Bremser, M.D.2    Ailey, K.S.3    Carlson, E.4    Perry, W.G.5    Davis, R.F.6
  • 4
    • 0035278804 scopus 로고    scopus 로고
    • The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETs
    • Mar.
    • R. Vetury, N.-Q. Zhang, S. Keller, and U. K. Mishra, "The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETs," IEEE Trans. Electron Devices, vol. 48, pp. 560-566, Mar. 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 560-566
    • Vetury, R.1    Zhang, N.-Q.2    Keller, S.3    Mishra, U.K.4
  • 5
    • 0005985130 scopus 로고    scopus 로고
    • GaN: Processing, defects, and devices
    • July
    • S. J. Pearton, J. C. Zolper, R. J. Shul, and F. Ren, "GaN: Processing, defects, and devices," J. Appl. Phys., vol. 86, no. 1, pp. 1-78, July 1999.
    • (1999) J. Appl. Phys. , vol.86 , Issue.1 , pp. 1-78
    • Pearton, S.J.1    Zolper, J.C.2    Shul, R.J.3    Ren, F.4
  • 10
    • 0035886086 scopus 로고    scopus 로고
    • Induced strain mechanism of current collapse in AlGaN/GaN heterostructure field-effect transistor
    • Oct.
    • G. Simm, A. Koudymox, A. Tarakji, X. Hu, J. Yang, M. A. Khan, M. S. Shur, and R. Gaska, "Induced strain mechanism of current collapse in AlGaN/GaN heterostructure field-effect transistor," Appl. Phys. Lett., vol. 79, pp. 2651-2653, Oct. 2001.
    • (2001) Appl. Phys. Lett. , vol.79 , pp. 2651-2653
    • Simm, G.1    Koudymox, A.2    Tarakji, A.3    Hu, X.4    Yang, J.5    Khan, M.A.6    Shur, M.S.7    Gaska, R.8
  • 11
    • 0035279282 scopus 로고    scopus 로고
    • Gallium nitride based high power heterojunction field effect transistor: Process development and present status at UCSB
    • Mar.
    • S. Keller, Y.-F. Wu, G. Parish, N. Zhang, J. J. Xu, B. P. Keller, S. P. DenBaars, and U. K. Mishra, "Gallium nitride based high power heterojunction field effect transistor: Process development and present status at UCSB," IEEE Trans. Electron Devices, vol. 48, pp. 552-559, Mar. 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 552-559
    • Keller, S.1    Wu, Y.-F.2    Parish, G.3    Zhang, N.4    Xu, J.J.5    Keller, B.P.6    Denbaars, S.P.7    Mishra, U.K.8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.