Electrostatic force microscopy study about the hole trap in thin nitride/oxide/semiconductor structure

Applied Physics Letters

Volumn 92, Issue 13, 2008, Pages

  Kim, Jong Hun ^a   Noh, Hyunho ^a   Khim, Z G ^a   Jeon, Kwang Sun ^b   Park, Young June ^b   Yoo, Hyunseung ^c   Choi, Eunseok ^c   Om, Jaechul ^c  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

^c Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON TUNNELING; ELECTROSTATIC FORCE; NITRIDES;

CONDUCTIVE ATOMIC FORCE MICROSCOPY; HOLE INJECTION; POSITIVE CHARGES;

THIN FILMS;

EID: 41649121279     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2904646     Document Type: Article

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