Photo-enhanced negative differential resistance and photo-accelerated time-dependent dielectric breakdown in thin nitride-oxide dielectric film

Applied Physics Letters

Volumn 78, Issue 21, 2001, Pages 3241-3243

  Chen, Fen ^a   Li, Baozhen ^a   Jammy, Rajarao ^a   Dufresne, Roger A ^a   Strong, Alvin W ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035927057     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1373409     Document Type: Article

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