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Physical Review Letters

Volumn 100, Issue 12, 2008, Pages

Tailoring the ultrathin Al-induced crystallization temperature of amorphous Si by application of interface thermodynamics

(4) Wang, Z M a Wang, J Y a Jeurgens, L P H a Mittemeijer, E J a

a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTALLIZATION; THERMODYNAMIC PROPERTIES; ULTRATHIN FILMS;

REAL-TIME IN SITU SPECTROSCOPIC ELLIPSOMETRY INVESTIGATION; SURFACE-INTERFACE THERMODYNAMICS;

AMORPHOUS SILICON;

EID: 41549154701 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.100.125503 Document Type: Article

Times cited : (50)

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