Interaction between hydrogen plasma and hydrogenated amorphous carbon film, investigated by infrared spectroscopy

Thin Solid Films

Volumn 516, Issue 13, 2008, Pages 4379-4383

  Shinohara, Masanori ^a   Cho, Ken ^a   Shibata, Hiromichi ^a   Okamoto, Keishi ^b   Nakatani, Tatsuyuki ^a,b   Matsuda, Yoshinobu ^a   Fujiyama, Hiroshi ^a  

^a NAGASAKI UNIVERSITY   (Japan)

^b Toyo Advanced Technologies Co Ltd   (Japan)

Author keywords

Hydrocarbon; Hydrogen; Infrared spectroscopy; Plasma etching

Indexed keywords

AMORPHOUS FILMS; BOND STRENGTH (CHEMICAL); FREE RADICALS; HYDROCARBONS; INFRARED SPECTROSCOPY; PLASMA ETCHING;

AMORPHOUS CARBON FILMS; BONDING CONFIGURATION; HYDROGEN PLASMA; HYDROGEN RADICALS;

CARBON FILMS;

EID: 41549099661     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.014     Document Type: Article

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