Development of fabrication process for integrated micro-optical elements on Si substrate

Sensors and Actuators, A: Physical

Volumn 143, Issue 1, 2008, Pages 77-83

  Ohara, Junji ^a   Kano, Kazuhiko ^a   Takeuchi, Yukihiro ^a  

^a DENSO CORPORATION   (Japan)

Author keywords

DRIE; Micro lens; Oxidation; Si substrate

Indexed keywords

OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; SILICON; THERMOOXIDATION;

DEEP REACTIVE ION ETCHING (DRIE); MICROLENS; SI SUBSTRATE; SINGLE ETCHING;

MICROOPTICS;

EID: 40949107814     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2007.07.022     Document Type: Article

References (13)

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