A new fabrication process for micro optical elements using drie and oxidation

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2007, Pages 279-282

  Ohara, Junji ^a   Kano, Kazuhiko ^a   Takeuchi, Yukihiro ^a  

^a Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL OXYGEN DEMAND; COMPOSITE MICROMECHANICS; ELECTRON BEAM LITHOGRAPHY; MASKS; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; NONMETALS; OPTICAL DESIGN; OPTICAL DEVICES; OXIDATION; SILICON;

DEEP REACTIVE ION ETCHING; FABRICATION PROCESSES; INTERNATIONAL CONFERENCES; LIGHT WAVES; MASK PATTERNING; MICRO LENSING; MICRO-ELECTRO MECHANICAL SYSTEMS; MICRO-OPTICAL ELEMENTS; OPTICAL ELEMENTS; SILICON SUBSTRATES;

REACTIVE ION ETCHING;

EID: 52149095647     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. Akihiko Nakai, Kiyoshi Matsumoto, and Isao Shimoyama, Technical digest of MEMS2002 pp.524-527
2. Hongrui Jiang, Kyutae Yoo, Jer-Liang, Andrrew Yeh, Zhihong Li and Norman C Tien, J.Micromech. Microeng. 12 (2002) pp.87-95
3. Chunbo Zhang and Khalil Najafi, Technical digest of MEMS2002 pp.160-163
4. Junji Ohara, Kazuhiko Kano, Yukihiro Takeuchi. Technical digest of MEMS2001 pp.76-79