Fabrication of thick silicon dioxide sacrificial and isolation blocks in a silicon substrate

Journal of Micromechanics and Microengineering

Volumn 12, Issue 1, 2002, Pages 87-95

  Jiang, Hongrui ^a,e   Yoo, Kyutae ^a   Yeh, Jer Liang Andrew ^b,f   Li, Zhihong ^a,c,d   Tien, Norman C ^c  

^a Cornell University   (United States)

^b Advanced Integrated Photonics Inc   (United States)

^c University of California   (United States)

^d PEKING UNIVERSITY   (China)

^e UNIVERSITY OF CALIFORNIA   (United States)

^f NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; DEPOSITION; ELECTRIC TRANSFORMERS; INTEGRATED CIRCUITS; MICROMACHINING; REACTIVE ION ETCHING; SUBSTRATES; SURFACES; THERMOOXIDATION;

DEEP-REACTIVE ION ETCHING; MONOLITHIC TRANSFORMER; ON-CHIP TUNABLE CAPACITOR; SILICON MICROMACHINING METHOD;

SILICA;

EID: 0036155728     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/12/1/314     Document Type: Article

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