Spatial dynamics of the light emission from a microplasma array

Applied Physics Letters

Volumn 92, Issue 10, 2008, Pages

  Waskoenig, J ^a,c   O'Connell, D ^a   Schulz Von Der Gathen, V ^a   Winter, J ^a   Park, S J ^b   Eden, J G ^b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b United States of America   (United States)

^c QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; INERT GASES; PLASMA DEVICES;

MICROPLASMA ARRAY; SPACE RESOLUTION;

LIGHT EMISSION;

EID: 40849105186     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2894227     Document Type: Article

References (22)

1. E. Stoffels, A. J. Flikweert, W. W. Stoffels, and G. M. W. Kroesen, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/11/4/304 11, 383 (2002).
2. V. Schulz-von der Gathen, V. Buck, T. Gans, N. Knake, K. Niemi, S. Reuter, L. Schaper, and J. Winter, Contrib. Plasma Phys. CPPHEP 0863-1042 10.1002/ctpp.200710066 47, 510 (2007).
3. J. Benedikt, K. Focke, A. Yanguas-Gil, and A. von Keudell, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2423233 89, 251504 (2006).
4. F. Iza, J. K. Lee, and M. G. Kong, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.99.075004 99, 075004 (2007).
5. A. Rousseau and X. Aubert, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/39/8/021 39, 1619 (2006).
6. J. Baars-Hibbe, P. Sichler, C. Schrader, N. Lucas, K.-H. Gericke, and S. Büttgenbach, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/38/4/002 38, 510 (2005).
7. J. G. Eden, S.-J. Park, J. Chen, and C. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1338971 78, 419 (2001).
8. J. G. Eden and S.-J. Park, Plasma Phys. Controlled Fusion PPCFET 0741-3335 10.1088/0741-3335/47/12B/S07 47, B83 (2005).
9. S.-J. Park, J. J. Ewing, and J. G. Eden, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1526159 81, 4529 (2002).
10. J. G. Eden, S.-J. Park, J. Chen, and C. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1401791 79, 2100 (2001).
11. J. Chen, S.-J. Park, Z. Fan, J. G. Eden, and C. Liu, J. Microelectromech. Syst. JMIYET 1057-7157 10.1109/JMEMS.2002.802907 11, 536 (2002).
12. S.-J. Park, J. Chen, C. J. Wagner, N. P. Ostrom, C. Liu, and J. G. Eden, IEEE J. Sel. Top. Quantum Electron. IJSQEN 1077-260X 10.1109/2944.991409 8, 139 (2002).
13. M. J. Kushner, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1636251 95, 846 (2004).
14. T. Gans, V. Schulz-von der Gathen, and H. F. Döbele, Contrib. Plasma Phys. CPPHEP 0863-1042 10.1002/ctpp.200410074 44, 535 (2004).
15. T. Gans, J. Schulze, D. O'Connell, U. Czarnetzki, R. Faulkner, A. R. Ellingboe, and M. M. Turner, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2425044 89, 261502 (2006).
16. D. O'Connell, T. Gans, D. Vender, U. Czarnetzki, and R. Boswell, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2717889 14, 034505 (2007).
17. M. Abdel-Rahman, T. Gans, V. Schulz-von der Gathen, and H. F. Döbele, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/14/ 1/007 14, 51 (2005).
18. A. Sublet, C. Ding, J.-L. Dorier, Ch. Hollenstein, P. Fayet, and F. Coursimault, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/15/ 4/006 15, 630 (2006).
19. L. Mangolini, K. Orlov, U. Kortshagen, J. Heberlein, and U. Kogelschatz, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1427427 80, 10 (2002).
20. I. Radu, R. Bartnikas, and M. R. Werthmeier, IEEE Trans. Plasma Sci. ITPSBD 0093-3813 10.1109/TPS.2003.820970 31, 1363 (2003).
21. Yu. B. Golubovskii, V. A. Mairov, J. Behnke, and J. F. Behnke, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/36/1/306 36, 39 (2003).
22. S.-J. Park, K.-F. Chen, N. P. Ostrom, and J. G. Eden, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1880441 86, 111501 (2005).