Development of ALD/PECVD reactor for high quality LTPS-TFTs insulator

ECS Transactions

Volumn 3, Issue 8, 2006, Pages 101-106

  Murata, Kazutoshi ^a   Miyatake, Naomasa ^a   Mori, Yasunari ^a   Tachibana, Hiroyuki ^a   Uraoka, Yukiharu ^b   Fuyuki, Takashi ^b  

^a MITSUI ENGINEERING AND SHIPBUILDING CO LTD   (Japan)

^b NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC BREAKDOWN; ELECTRIC INSULATORS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SUBSTRATES;

ATOMIC LAYER DEPOSITION (ALD); BREAKDOWN ELECTRICAL FIELD; GLASS SUBSTRATES;

THIN FILM TRANSISTORS;

EID: 33847007346     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2356341     Document Type: Conference Paper

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