Estimation of the TEOS dissociation coefficient by electron impact

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2728-2732

  Vallee C ^a,b   Rhallabi, A ^a   Granier, A ^a   Goullet, A ^a   Turban, G ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; DEPOSITION; DISSOCIATION; ELECTRONS; HELICONS; MIXTURES; PLASMA APPLICATIONS; PRESSURE EFFECTS;

DISSOCIATION COEFFICIENT; TETRAETHOXYSILANE;

REACTION KINETICS;

EID: 0034315816     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319820     Document Type: Article

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