On the post-contamination effect on the delamination of sputtered amorphous carbon nitride films

Solid State Communications

Volumn 146, Issue 1-2, 2008, Pages 78-82

  Peponas, S ^a,b   Guedda, M ^b   Benlahsen, M ^a  

^a Universite de Picardie Jules Verne   (France)

^b Faculté de Mathématiques et d Informatique   (France)

Author keywords

A. Surfaces and interfaces; A. Thin films; D. Mechanical properties; E. Strain, high pressure

Indexed keywords

AMORPHOUS FILMS; CONTAMINATION; DELAMINATION; HIGH PRESSURE EFFECTS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; THIN FILMS;

MICROSTRUCTURE ANALYSIS; POST-CONTAMINATION EFFECT; POST-DEPOSITION CONTAMINATION; WORM-LIKE STRUCTURES;

CARBON NITRIDE;

EID: 40249100145     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2008.01.015     Document Type: Article

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