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Volumn 13, Issue 10, 2004, Pages 1854-1858

Atomic rearrangement of sputtered amorphous carbon nitride thin films during growth

Author keywords

Mechanical properties; Points defects; Thin films

Indexed keywords

AMORPHOUS MATERIALS; BONDING; CRYSTAL ATOMIC STRUCTURE; FILM GROWTH; MAGNETRON SPUTTERING; MICROSTRUCTURE; NATURAL FREQUENCIES; POINT DEFECTS; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; SILICON WAFERS; THIN FILMS;

EID: 9744250308     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.05.005     Document Type: Article
Times cited : (21)

References (24)
  • 12
    • 9744264794 scopus 로고    scopus 로고
    • PhD thesis, University of Picardie Jules Verne, June 28th, Amiens
    • O. Durand-Drouhin, PhD thesis, University of Picardie Jules Verne, June 28th, Amiens (2001).
    • (2001)
    • Durand-Drouhin, O.1
  • 15
    • 0001642286 scopus 로고
    • F. Abeles (Ed.), North Holland, Amsterdam
    • J. Taue, in: F. Abeles (Ed.), Optical Properties of Solids, North Holland, Amsterdam, 1972, p. 277.
    • (1972) Optical Properties of Solids , pp. 277
    • Taue, J.1
  • 24
    • 0003312415 scopus 로고
    • L.I. Maissel, R. Glang (Eds.), McGraw-Hill, New York
    • D.S. Campbell, in: L.I. Maissel, R. Glang (Eds.), Handbook of Thin Films Technology, McGraw-Hill, New York, 1970, p. 12.
    • (1970) Handbook of Thin Films Technology , pp. 12
    • Campbell, D.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.