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Volumn 79, Issue 2, 2008, Pages

Fourth-generation plasma immersion ion implantation and deposition facility for hybrid surface modification layer fabrication

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ION IMPLANTATION; LABORATORIES; MAGNETRON SPUTTERING; SHAFTS (MACHINE COMPONENTS); VACUUM;

EID: 40149090654     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2870088     Document Type: Article
Times cited : (40)

References (15)
  • 2
    • 0031223620 scopus 로고    scopus 로고
    • SCTEEJ 0257-8972 10.1016/S0257-8972(97)00037-6.
    • A. Anders, Surf. Coat. Technol. SCTEEJ 0257-8972 10.1016/S0257-8972(97) 00037-6 93, 158 (1997).
    • (1997) Surf. Coat. Technol. , vol.93 , pp. 158
    • Anders, A.1
  • 5
    • 0036641177 scopus 로고    scopus 로고
    • SCTEEJ 0257-8972 10.1016/S0257-8972(02)00069-5.
    • K. Yukimura and S. Masamune, Surf. Coat. Technol. SCTEEJ 0257-8972 10.1016/S0257-8972(02)00069-5 156, 31 (2002).
    • (2002) Surf. Coat. Technol. , vol.156 , pp. 31
    • Yukimura, K.1    Masamune, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.