Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source

Optics Letters

Volumn 32, Issue 10, 2007, Pages 1338-1340

  Tao, Y ^a   Tillack, M S ^a   Harilal, S S ^a   Sequoia, K L ^a   Burdt, R A ^a   Najmabadi, F ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT PRESSURE; ENERGETIC IONS;

EXTREME ULTRAVIOLET LITHOGRAPHY; INERT GAS WELDING; IRRADIATION; LIGHT ABSORPTION; TIN;

LASER PULSES;

EID: 39749153524     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.32.001338     Document Type: Article

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