Deep reactive ion etching for high aspect ratio microelectromechanical components

Physica Scripta T

Volumn T114, Issue , 2004, Pages 188-192

  Jensen, Søren ^a   Yalçinkaya, Arda D ^a   Jacobsen, Søren ^a   Rasmussen, Torben ^a   Rasmussen, Frank Engel ^a   Hansen, Ole ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MEMS; REACTIVE ION ETCHING; RESONATORS; SEMICONDUCTING SILICON;

DEEP REACTIVE ION ETCHING; TUNABLE CAPACITORS;

MICROELECTROMECHANICAL DEVICES;

EID: 39549119315     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1088/0031-8949/2004/T114/047     Document Type: Conference Paper

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