Charge build-up in Si-processing plasma caused by electron shading effect

Journal of Applied Physics

Volumn 80, Issue 5, 1996, Pages 2637-2642

  Kamata, T ^a   Arimoto, H ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000341686     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363179     Document Type: Article

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