Evaluation of electron shading charge buildup damage using metal-nitride-oxide-silicon capacitors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 4 SUPPL. B, 1997, Pages 2521-2525

  Sakamori, Shigenori ^a   Maruyama, Takahiro ^a   Fujiwara, Nobuo ^a   Miyatake, Hiroshi ^a   Yoneda, Masahiro ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Charge buildup; Electron cyclotron resonance; Microwave plasma; MNOS capacitor; Oxide degradation; Plasma etching; Pulse modulated

Indexed keywords

ELECTRON SHADING; METAL NITRIDE OXIDE SILICON (MNOS) CAPACITORS;

ASPECT RATIO; CAPACITORS; DEGRADATION; ELECTRIC CHARGE; ELECTRODES; ELECTRON CYCLOTRON RESONANCE; GATES (TRANSISTOR); OXIDES; POLYCRYSTALLINE MATERIALS; SILICON; SUBSTRATES;

PLASMA ETCHING;

EID: 0031119713     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.2521     Document Type: Review

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