Suppression of electron shading effect by a counter radio frequency bias in plasma etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3688-3691

  Kamata, T ^a   Arimoto, H ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2442525556     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588648     Document Type: Article

References (15)

1. N. Fujiwara, T. Maruyama, and M. Yoneda, 16th Proceeding Symposium on Dry Process, 1994 (unpublished), p. 31.
2. N. Fujiwara, S. Ogino, T. Maruyama, and M. Yoneda, Plasma Sources Sci. Technol. 5, 126 (1996).
3. T. Kinoshita, M. Hane, and J. P. McVittie, J. Vac. Sci. Technol. B 14, 560 (1996).
4. K. Hashimoto, Jpn. J. Appl. Phys. 32, 6109 (1993).
5. K. Hashimoto, Jpn. J. Appl. Phys. 33, 6013 (1994).
6. H. Hayashi, K. Kurihara, and M. Sekine, 18th Proceeding Symposium on Dry Process, 1995 (unpublished), p. 225.
7. K. Kurihara and M. Sekine, Plasma Sources Sci. Technol. 5, 121 (1996).
8. J. C. Arnold and H. H. Sawin, J. Appl. Phys. 70, 5314 (1991).
9. T. Shibayama, H. Shindo, and Y. Horiike, Plasma Sources Sci. Technol. 5, 254 (1996).
10. S. Samukawa, Y. Nakagawa, and K. Ikeda, Jpn. J. Appl. Phys. 29, 88 (1990).
11. S. Samukawa and T. Mieno, Plasma Sources Sci. Technol. 5, 126 (1996).
12. K. Hashimoto, Y. Hikosaka, A. Hasegawa, and M. Nakamura, 17th Proceeding Symposium on Dry Process, 1995 (unpublished), p. 33.
13. T. Kamata and H. Arimoto, J. Appl. Phys. 80, 2637 (1996).
14. F. Tochikubo, T. Kokubo, S. Kakuta, A. Suzuki, and T. Makabe, J. Phys. D 23, 1184 (1990).
15. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), Chap. 11, p. 366.