Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages 189-194

  Kim, Su Jin ^a   Maeng, W J ^a   Lee, S K ^a   Park, D H ^a   Bang, Sung Hwan ^a   Kim, Hyungjun ^a   Sohn, Byeong Hyeok ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; DRY ETCHING; INTERFACIAL ENERGY; POLYMETHYL METHACRYLATES; POLYSTYRENES; SELF ASSEMBLED MONOLAYERS;

CYLINDRICAL NANOHOLE ARRAY; SUBSTRATE SURFACE; SURFACE NEUTRALIZATION;

NANOTECHNOLOGY;

EID: 38849087507     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2830693     Document Type: Article

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