Initial assessment of the lithographic impact of the use of hard pellicles: An overview

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 116-123

  De Bisschop, Peter ^a   Kocsis, Michael ^a,d   Bruls, Richard ^b   Grenville, Andrew ^c,d   Van Peski, Chris ^c  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

^c Imec   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

157 nm lithography; Experimental assessment; Hard pellicle

Indexed keywords

FOURIER TRANSFORMS; FUSED SILICA; INTERFEROMETERS; OPTICAL MATERIALS; PHASE SHIFT; PROJECTION SYSTEMS; SCANNING;

157 NM LITHOGRAPHY; FOURIER TRANSFORM PHASE SHIFTING INTERFEROMETERS (FTPSI); HARD PELLICLES (HP); SCANNERS;

PHOTOLITHOGRAPHY;

EID: 3843113219     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537530     Document Type: Conference Paper

References (10)

1. P. De Bisschop, M. Kocsis, R. Bruls, C. Van Peski, A. Grenville, 'Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system', JM3 3 (2004) Number 2, April 2004.
2. SEMI Standard "Standard for Fused-Silica Pellicle/Reticle Systems for use in 157nm Exposure Systems", Rev. 0_C, Aug. 21, 2003
3. P. De Bisschop, "Evaluation of Litel's In-situ Interferometer technique for measuring projection lens aberrations: an initial study", Proc SPIE 5040, 11 (2003)
4. P. Dirksen, R. Pellens, C. Juffermans, M. Reuhman-Huisken, H. van der Laan, 'Focus and exposure dose determination using stepper alignment', in 'Optical Microlithography IX', Proc SPIE 2726, 799 (1996)
5. L.L. Deck, C. Van Peski, R. Eandi, "Measurements of hard pellicles for 157 nm lithography using Fourier transform phase-shifting interferometry", in 'Photomask Japan 2003', Proc SPIE 5130 (2003)
6. M. Kocsis, P. De Bisschop, R. Bruis, C. Van Peski, A. Grenville, 'Initial assessment of the lithographic impact of the use of hard pellicles on distortion', Proc SPIE 5377 (2004)
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