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Volumn 3873, Issue pt 1, 1999, Pages 372-385
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Challenges and opportunities for 157 nm mask technology
a
a
ASML
(Netherlands)
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Author keywords
[No Author keywords available]
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Indexed keywords
CALCIUM COMPOUNDS;
CRYSTALS;
FUSED SILICA;
INSTRUMENT SCALES;
LIGHT ABSORPTION;
MASKS;
OPTICAL MATERIALS;
QUARTZ APPLICATIONS;
SUBSTRATES;
THERMAL EFFECTS;
THERMAL EXPANSION;
CALCIUM FLUORIDE;
MASK ERROR FACTOR;
RETICLES;
STEPPER REDUCTION RATIO;
PHOTOLITHOGRAPHY;
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EID: 0033342959
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.373333 Document Type: Conference Paper |
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Times cited : (4)
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References (13)
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