Initial assessment of the impact of a hard pellicle on imaging using a 193-nm step-and-scan system

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 2, 2004, Pages 239-262

  De Bisschop, Peter ^a   Kocsis, Michael ^a   Bruls, Richard ^b   Van Peski, Chris ^c   Grenville, Adrew ^c  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

^c SEMATECH   (United States)

Author keywords

157 nm lithography; 193 nm scanner; Hard pellicles

Indexed keywords

157-NM LITHOGRAPHY; 193-NM SCANNER; CRITICAL DIMENSIONS; HARD PELLICLES;

ABERRATIONS; APPROXIMATION THEORY; CORRELATION METHODS; INTERFEROMETERS; OXYGEN; PHASE SHIFT; SCANNING;

IMAGING TECHNIQUES;

EID: 2542466170     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1683279     Document Type: Article

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