Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1121-1132

  Cotte, Eric P ^a   Reu, Phillip L ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Grenville, Andrew ^b   Van Peski, Chris K ^b  

^a University of Wisconsin Madison   (United States)

^b SEMATECH   (United States)

Author keywords

157 nm lithography; Acoustic loading; Dynamic response; Pellicle; Photomask; Reticle handling

Indexed keywords

ACOUSTICS; DYNAMIC RESPONSE; FLUID STRUCTURE INTERACTION; FUSED SILICA; LITHOGRAPHY;

ACOUSTIC EXCITATION;

MASKS;

EID: 0038303040     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468606     Document Type: Conference Paper

References (5)

1. Chen, W., Carroll, J., Storm, G., Ivancich, R., Maloney, J., Maurin, O., and Souleillet, E., "Pellicle-Induced Reticle Distortion: An Experimental Investigation," SPIE, Vol. 3546, pp. 167-172,1998.
2. Röth, K.-D., and Struck, T., "Pellicle-Induced Distortions on Photomasks," SPIE, Vol. 3412, pp. 440-446, 1998.
3. nd International Symposium on 157 nm Lithography, International SEMATECH, 2001.
4. Cotte, E., Engelstad, R., Lovell, E., Shkel, Y., E., Eschbach, F., Shu, E., Tanzil, D., and Calhoun, R., "Distortions in Advanced Photomasks from Soft Pellicles," Microelectronic Engineering, Vol. 61-62, pp. 187-192, 2001.
5. Cotte, E., Abdo, A., Engelstad, R., and Lovell, E., "Dynamic Studies of Hard Pellicle Response during Exposure Scanning," to appear in the Journal of Vacuum Science and Technology B, Nov./Dec., 2002.