Measurements of hard pellicles for 157nm lithography using Fourier transform phase-shifting interferometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 555-562

  Deck, Leslie L ^a   Van Peski, Chris ^b   Eandi, Richard ^a  

^a ZYGO CORPORATION   (United States)

^b SEMATECH   (United States)

Author keywords

157nm lithography; Distortion; Interferometry; Metrology; Pellicles; Photomasks

Indexed keywords

157NM LITHOGRAPHY; PELLICLES; PHOTOMASKS;

CAMERAS; CHARGE COUPLED DEVICES; FOURIER TRANSFORMS; FUSED SILICA; IMAGE PROCESSING; LITHOGRAPHY; MASKS; PHASE SHIFT; REFLECTION; REFRACTION; SEMICONDUCTOR MATERIALS; SURFACE TOPOGRAPHY;

INTERFEROMETRY;

EID: 1642555694     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504217     Document Type: Conference Paper

References (4)

1. Cotte, E., Engelstad, R., Lovell, E., Shkel, Y., Eschbach, F., Shu, E., Tanzil, D., and Calhoun, R. "Numerical and Experimental Studies of Pellicle-induced Photomask Distortions", Proceedings of BACUS, 2001
2. Final Report, International SEMATECH Hard Pellicle Task Force, July 2002
3. Deck, L., "Measurements using Fourier Transform Phase Shifting Interferometry", Proc. ASPE 25, 115-118 (2001)
4. Deck, L., "Multiple Surface Phase Shifting Interferometry", Proc. SPIE, 4451, 424-430 (2001)