RET integration of CPL™ technology for random logic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 510-526

  Hsu, Stephen D ^a   Van Den Broeke, Doug ^a   Chen, J Fung ^a   Shi, Xuelong ^a   Hsu, Michael ^a   Laidig, Tom ^a   Conley, Will ^b   Litt, Lloyd ^b   Wu, Wei ^b  

^a ASML US Inc   (United States)

^b MOTOROLA INC   (United States)

Author keywords

6 attenuated PSM; CD control; CPL Technology; Scattering Bar OPC; Transmission tuning

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; ELECTROMAGNETIC WAVE DIFFRACTION; INTEGRATED CIRCUITS; LIGHT TRANSMISSION; LIGHTING; MASKS; OPTICAL RESOLVING POWER; OPTIMIZATION; PHASE SHIFT; THROUGHPUT;

6% ATTENUATED PSM; CD CONTROL; CHROMELESS PHASE LITHOGRAPHY (CPL) TECHNOLOGY; SCATTERING BAR OPC; TRANSMISSION TUNING;

PHOTOLITHOGRAPHY;

EID: 3843097035     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537414     Document Type: Conference Paper

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