Low k 1 Lithography Patterning Option for the 90nm and 65nm Nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 812-828

  Hsu, Stephen D ^a   Van Den Broeke, Doug ^a   Shi, Xuelong ^a   Hsu, Michael ^a   Wampler, Kurt ^a   Chen, J Fung ^a   Yu, Annie ^b   Yang, Samuel ^b   Hsieh, Frank ^b  

^a ASML US Inc   (United States)

^b Toppan Chunghwa Electronics Co Ltd   (Taiwan)

Author keywords

6 attenuated PSM; CD control; Chromeless Phase Lithography (CPL); Scattering bar OPC; Transmission tuning

Indexed keywords

CHROMELESS PHASE LITHOGRAPHY (CPL); MASK ERROR ENHANCEMENT FACTORS (MEEF); TRANSMISSION TUNING;

COMPUTER SIMULATION; DEGREES OF FREEDOM (MECHANICS); ELECTROMAGNETIC WAVE DIFFRACTION; ERROR ANALYSIS; FABRICATION; IMAGE QUALITY; INTEGRATED OPTICS; LIGHT SCATTERING; LIGHT TRANSMISSION; MASKS; OPTIMIZATION; PHASE SHIFT; SILICON WAFERS; TUNING;

PHOTOLITHOGRAPHY;

EID: 0942290248     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504394     Document Type: Conference Paper

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