Validation of lithography based on the controlled movement of light-emitting particles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 566-578

  Park, Benjamin Y ^a   Zaouk, Rabih ^a   Madou, Marc ^a  

^a University of California at Irvine   (United States)

Author keywords

C MEMS; Carbon; Dielectrophoresis; Electroosmosis; Lithography; Nanolithography; Nanomanipulation; Particle

Indexed keywords

C-MEMS; DIELECTROPHORESIS; LIGHT EMITTING PARTICLES; NANOMANIPULATION;

ASPECT RATIO; CARBON; ELECTROOSMOSIS; ELECTROPHORESIS; LIGHT EMISSION; MICROELECTROMECHANICAL DEVICES; NANOTECHNOLOGY; PARTICLES (PARTICULATE MATTER);

LITHOGRAPHY;

EID: 3843071045     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534355     Document Type: Conference Paper

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