The real cost of RETs

Microlithography World

Volumn 12, Issue 2, 2003, Pages

  Mason, Mark E ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; COMPUTER SIMULATION; COSTS; INSPECTION; INTEGRATED CIRCUIT MANUFACTURE; MASKS; SILICON WAFERS;

COST OF OWNERSHIP ANALYSIS; RESOLUTION ENHANCEMENT TECHNOLOGIES;

LITHOGRAPHY;

EID: 13244261957     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (6)

1. Lithography CoO analysis from International Sematech is available on the web at http://www.sematech.org/public/resources/litho/coo/index.htm.
2. 157nm cost-effective lithography, 2nd International 157nm Symposium, Dana Point, CA, May 2001.
3. B. Grenon, K. Kimmel, W. Trybula, "The financial impact of technology acceleration on semiconductor masks," Proc. BACUS, Monterey, CA, Oct. 2001.
4. W. Trybula, et al., "Cost of mask fabrication: Emerging lithographic technologies," SPIE Proceedings, Vol. 3048, pp. 211-215, 1997.
5. Int'l. Sematech Mask Data Workshop, San Francisco, CA, June 11, 2001.
6. Informal communications between the author and various IDMs, mask shops, and EDA suppliers.