Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4070-4073

  Keyser, Christian ^a   Bernath, Robert ^a   Al Rabban, Moza ^a   Richardson, Martin ^a,b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b QATAR UNIVERSITY   (Qatar)

Author keywords

EUV lithography; Laser plasma; Water droplet target

Indexed keywords

COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; INTERFEROMETRY; PHOTOLITHOGRAPHY; PLASMA DIAGNOSTICS; ULTRAVIOLET RADIATION;

PLASMA EXPANSION;

LASER PRODUCED PLASMAS;

EID: 0036614388     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4070     Document Type: Article

References (14)