Characterization of low-Z material layer profiles in bilayer structures by X-ray reflectivity measurement

Guangxue Jingmi Gongcheng/Optics and Precision Engineering

Volumn 15, Issue 12, 2007, Pages 1838-1843

  Xu, Yao ^a   Wang, Zhan Shan ^a   Xu, Jing ^a   Zhang, Zhong ^a   Wang, Hong Chang ^a   Zhu, Jing Tao ^a   Wang, Feng Li ^a   Wang, Bei ^a   Qin, Shu Ji ^a   Chen, Ling Yan ^a  

^a TONGJI UNIVERSITY   (China)

Author keywords

Low Z material; Reflectivity measurement; Thin films; XRD

Indexed keywords

CHROMIUM; DEPOSITION RATES; OPTICAL CONSTANTS; REFLECTION; SILICON; THIN FILMS; X RAY DIFFRACTION;

BASE LAYER (BL); LOW Z MATERIAL; REFLECTIVITY MEASUREMENT; X RAY DIFFRACTOMETER (XRD);

DIFFRACTOMETERS;

EID: 38349036356     PISSN: 1004924X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)

1. SPILLER E. Soft X-ray Optics [M]. SPIE, Bellingham, WA, 1994.
2. WANG ZH SH, WANG F L, ZHANG ZH, et al.. Research of multilayers in EUV, soft X-ray and X-ray [J]. Opt. Precision Eng., 2005, 13 (4): 512-518.
3. 4C, W/C, W/Si multilayers [J]. Opt. Precision Eng., 2005, 13 (1): 28-33.
4. ATTWOOD D. Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications [M]. Cambridge: University Press, 2000.
5. HOLY V, KUBENA J, OHLIDAL I, et al. X-ray reflection from rough layered systems. [J]. Physical Review B (Condensed Matter and materials Physics), 1993, 47 (23): 15896-15903.
6. STEARNS D, GAINES D, SWEENEY D, et al. Nonspecular X-ray scattering in a multilayer-coated imaging system [J]. Journal of Applied Physics, 1994, 84 (2). 1003-1028.
7. CHAIKEN A, MICHEL R, WALL M. Structure and magnetism of Fe/Si multilayers grown by ion-beam sputtering [J]. Physical Review B, 1996, 53 (9): 5518-5529.
8. KICHTER A, GUICO R, WANG J. Calibrating an ellipsometer using X-ray reflectivity [J]. Review of Scientific Instruments, 2001. 72 (7): 3004-3007.
9. 2 upon thermal annealing [J]. Applied Physics Letters, 2002, 80 (17): 3075-3077.
10. WANG H, WANG Z, ZHANG S, et al. Fabrication and characterization of Ni thin films using direct-current magnetron sputtering [J]. Chinese. Physics Letters, 2005, 22 (8): 2106-2108.
11. XU Y, WANG Z, WANG B, et al. Determination of tungsten layer profiles in bilayer structures using X-ray reflectivity method [J]. Chinese Physics Letters, 2007, 24 (2): 366-369.
12. DENIS Y, YU W, SPAEPEN F. The yield strength of thin copper films on Kapton [J]. Journal of Applied Physics, 2004, 95 (6): 2991-2997.
13. 2/Si (001) multilayer structures using X-ray reflectivity technique [J]. Applied Physics Letters, 2004, 84 (19): 3798-3800.
14. VOORMA H, LOUIS E, ROSTER N, et al. Characterization of multilayers by Fourier analysis of X-ray reflectivity [J]. Journal of Applied Physics, 1997, 81 (9): 6112-6119.
15. WORMINGTON M. PANACCIONE C. Characterization of structures from X-ray scattering data using genetic algorithms [J]. Philosophical Transactions of the Royal Society A, 1999, 357 (1761): 2827-2848.
16. BOWEN D, TANNER B. High Resolution X-ray Diffraction and Topography [M]. Taylor and Francis, 1998.