-
1
-
-
36449004477
-
Microdiffraction instrumentation and experiments on the microfocus beamline at the ESRF
-
ENGSTR ÖM P, FIEDIER S, RIEKEL C. Microdiffraction instrumentation and experiments on the microfocus beamline at the ESRF [J]. Rev. Sci. Instrum., 1995, 66(2): 1348-1350.
-
(1995)
Rev. Sci. Instrum.
, vol.66
, Issue.2
, pp. 1348-1350
-
-
Engstr, ÖM.P.1
Fiedier, S.2
Riekel, C.3
-
2
-
-
0000709164
-
Reflection X-ray fluorescence spectroscopy using synchrotron radiation for wafer surface trace impurity analysis (invited)
-
PIANETTA P, TAKAURA N, BRENNAN S, et al. Reflection X-ray fluorescence spectroscopy using synchrotron radiation for wafer surface trace impurity analysis (invited) [J]. Rew. Sci. Instrum., 1995, 66(2): 1239-1297.
-
(1995)
Rew. Sci. Instrum.
, vol.66
, Issue.2
, pp. 1239-1297
-
-
Pianetta, P.1
Takaura, N.2
Brennan, S.3
-
4
-
-
0027639238
-
4C multilayer mirrors in the 34-50-A wavelength region
-
4C multilayer mirrors in the 34-50-A wavelength region [J]. Appl. Opt., 1993, 32(19): 3541-3543.
-
(1993)
Appl. Opt.
, vol.32
, Issue.19
, pp. 3541-3543
-
-
Seely, J.F.1
Gutman, G.2
Wood, J.3
-
5
-
-
0037115187
-
4C X-ray multilayers in the range 1.0 nm < λ < 2.4 nm
-
4C X-ray multilayers in the range 1.0 nm < λ <2.4 nm [J]. Opti. Lett., 2002, 27(24): 2212-2214.
-
(2002)
Opti. Lett.
, vol.27
, Issue.24
, pp. 2212-2214
-
-
Windt, D.L.1
-
6
-
-
0012202007
-
4C multilayers for X-ray optics-microstructure limits on reflectivity
-
Berkeley, Calif.
-
4C multilayers for X-ray optics-microstructure limits on reflectivity [D]. Dissertation University of California, Berkeley, Calif., 1997.
-
(1997)
Dissertation University of California
-
-
Walton, C.C.1
-
7
-
-
0001368790
-
Growth, structure, and performance of depth-graded W/Si multilayers for hard X-ray optics
-
WINDT D L, CHRISTENSEN F E, CRAIG W W, et al. Growth, structure, and performance of depth-graded W/Si multilayers for hard X-ray optics [J]. J. Appl. Phys., 2000, 88(1): 460-470.
-
(2000)
J. Appl. Phys.
, vol.88
, Issue.1
, pp. 460-470
-
-
Windt, D.L.1
Christensen, F.E.2
Craig, W.W.3
-
8
-
-
1842790488
-
X-ray study of W/Si multilayers for the HEFT hard X-ray telescope
-
MADSENA K K, CHRISTENSEN F E, JENSENA C P, et al. X-ray study of W/Si multilayers for the HEFT hard X-ray telescope [J]. SPIE, 2004, 5168: 41-52.
-
(2004)
SPIE
, vol.5168
, pp. 41-52
-
-
Madsena, K.K.1
Christensen, F.E.2
Jensena, C.P.3
-
9
-
-
15944378777
-
Research of the beam splitters for X-ray laser applications
-
Chinese source
-
WANG ZH SH, WU Y G, TANG W X, et al. Research of the beam splitters for X-ray laser applications [J]. Science Report, 2003, 48(13): 1398-4001. (in Chinese)
-
(2003)
Science Report
, vol.48
, Issue.13
, pp. 1398-4001
-
-
Wang, Z.S.1
Wu, Y.G.2
Tang, W.X.3
-
10
-
-
15944390460
-
Measurement of residual stress in molybdenum/silicon multiplayer coatings
-
Chinese source
-
XIANG P. JIN CH SH. Measurement of residual stress in molybdenum/silicon multiplayer coatings [J]. Optics and Precision Engineering, 2003, 1(11): 62-67. (in Chinese)
-
(2003)
Optics and Precision Engineering
, vol.1
, Issue.11
, pp. 62-67
-
-
Xiang, P.1
Jin, C.S.2
-
11
-
-
15944393918
-
4C multiplayer at wavelength of 8.0 nm for X-ray laser
-
Chinese source
-
4C multiplayer at wavelength of 8.0 nm for X-ray laser [J]. Atomic Energy Science and Technology, 1999, 33(4): 343-345. (in Chinese)
-
(1999)
Atomic Energy Science and Technology
, vol.33
, Issue.4
, pp. 343-345
-
-
Lu, J.X.1
Ma, Y.Y.2
Pei, S.3
-
12
-
-
0031370240
-
The microstructures of the nano-laminated SiC/W films grown by magnetron sputtering
-
Chinese source
-
YANG X Y, CAI X, LI Y, et al. The microstructures of the nano-laminated SiC/W films grown by magnetron sputtering [J]. Vacuum Science and Technology, 1997, 17(6): 412-416. (in Chinese)
-
(1997)
Vacuum Science and Technology
, vol.17
, Issue.6
, pp. 412-416
-
-
Yang, X.Y.1
Cai, X.2
Li, Y.3
-
13
-
-
0000880749
-
Characterization of multilayers by Fourier analysis of X-ray reflectivity
-
VOORMA H J, LOUIS E, ROSTER N B, et al. Characterization of multilayers by Fourier analysis of X-ray reflectivity [J]. J. Appl. Phys., 1997, 81(9): 6112-6119.
-
(1997)
J. Appl. Phys.
, vol.81
, Issue.9
, pp. 6112-6119
-
-
Voorma, H.J.1
Louis, E.2
Roster, N.B.3
-
14
-
-
0343644373
-
Precise determination of the periodicity for Mo/Si and W/C multilayers by electron and X-ray diffraction
-
JANG S S, ZOU J, COCKAYNE D J H, et al. Precise determination of the periodicity for Mo/Si and W/C multilayers by electron and X-ray diffraction [J]. J. Appl. Phys., 1995, 77(1): 167-171.
-
(1995)
J. Appl. Phys.
, vol.77
, Issue.1
, pp. 167-171
-
-
Jang, S.S.1
Zou, J.2
Cockayne, D.J.H.3
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