Crystallographic structure and composition of vanadium nitride films deposited by direct sputtering of a compound target

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 1, 2004, Pages 146-150

  Liao, M Y ^a   Gotoh, Y ^a   Tsuji, H ^a   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ELECTRON ENERGY LEVELS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; VANADIUM COMPOUNDS;

DEPOSITION CHAMBERS; DIFFUSION BARRIERS;

THIN FILMS;

EID: 1242306891     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1631473     Document Type: Article

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