Growth of stoichiometric subnanometer silica films

Applied Physics Letters

Volumn 92, Issue 1, 2008, Pages

  Stacchiola, D J ^a   Baron, M ^a   Kaya, S ^a   Weissenrieder, J ^a   Shaikhutdinov, S ^a   Freund, H J ^a  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; PHOTOELECTRONS; SEMICONDUCTOR DEVICES; STOICHIOMETRY;

MODEL OXIDES; SILICA FILMS; STOICHIOMETRIC SUBNANOMETER;

SILICA;

EID: 38049001439     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2824842     Document Type: Article

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