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Volumn 69, Issue 15, 2004, Pages

Sb surface segregation during epitaxial growth of SiGe heterostructures: The effects of Ge composition and biaxial stress

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; GERMANIUM; SILICON;

EID: 37649032927     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.69.155414     Document Type: Article
Times cited : (25)

References (22)
  • 4
    • 1142280127 scopus 로고    scopus 로고
    • edited by S. Luryi, J. Xu, and A. Zaslavsky (Wiley, New York)
    • E. Kasper, G. Reitemann, in Future Trends in Microelectronics, edited by S. Luryi, J. Xu, and A. Zaslavsky (Wiley, New York, 1999), p. 125.
    • (1999) Future Trends in Microelectronics , pp. 125
    • Kasper, E.1    Reitemann, G.2
  • 6
    • 33646663842 scopus 로고    scopus 로고
    • Ph.D. Thesis, University Aix-Marseille
    • A. Portavoce, Ph.D. Thesis, University Aix-Marseille, 2002.
    • (2002)
    • Portavoce, A.1
  • 7
    • 33646652281 scopus 로고    scopus 로고
    • unpublished
    • A. Portavoce et al. (unpublished).
    • Portavoce, A.1
  • 22
    • 0003689862 scopus 로고
    • edited by T. B. Massalski, H. Okamoto, P. R. Subramanian, and L. Kacprzak (ASM International, Materials Park, OH)
    • W. W. Scott Jr., Binary Alloy Phase Diagrams, edited by T. B. Massalski, H. Okamoto, P. R. Subramanian, and L. Kacprzak (ASM International, Materials Park, OH, 1990).
    • (1990) Binary Alloy Phase Diagrams
    • Scott Jr., W.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.