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Volumn 76, Issue 23, 2007, Pages

Room-temperature annealing of vacancy-type defect in high-purity n -type Si

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EID: 37649012759     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.76.233204     Document Type: Article
Times cited : (19)

References (17)
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    • URL
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    • JAPIAU 0021-8979 10.1063/1.366269
    • A. A. Istratov, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.366269 82, 2965 (1997).
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  • 9
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    • JAPIAU 0021-8979 10.1063/1.1663719
    • D. V. Lang, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1663719 45, 3023 (1974).
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    • Lang, D.V.1
  • 13
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    • Ph.D. thesis, University of Hamburg, Hamburg
    • M. Moll, Ph.D. thesis, University of Hamburg, Hamburg 1999.
    • (1999)
    • Moll, M.1
  • 16
    • 4244125311 scopus 로고
    • PLRBAQ 0556-2805 10.1103/PhysRevB.9.4351
    • Y.-H. Lee and J. W. Corbett, Phys. Rev. B PLRBAQ 0556-2805 10.1103/PhysRevB.9.4351 9, 4351 (1974).
    • (1974) Phys. Rev. B , vol.9 , pp. 4351
    • Lee, Y.-H.1    Corbett, J.W.2


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