Surface patterning using blister exfoliation induced by electron irradiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 12, 2007, Pages 7812-7815

  Igarashi, Shinichi ^a,b   Itakura, Akiko N ^a,b   Kitajima, Masahiro ^a,c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Auger electron spectroscopy; Blister; Ion implantation; Oxidation; Patterning; Silicon; Surface stress

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; HYDROGEN; ION IMPLANTATION; OXIDATION;

BLISTERS; SURFACE STRESS;

SILICON;

EID: 37549072216     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.7812     Document Type: Article

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