Nanoscopic observation of structural and compositional changes for β-FeSi2 thin film formation processes

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 99-105

  Yamamoto, Hiroyuki ^a   Yamaguchi, Kenji ^a   Hojou, Kiichi ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Nanostructure; Semiconductor surfaces; Synchrotron radiation; Transmission electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; COMPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; IRON COMPOUNDS; SEMICONDUCTOR MATERIALS; SILICON COMPOUNDS; SPUTTERING; SUBSTRATES; SYNCHROTRON RADIATION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLINITY; NANOSTRUCTURE; SEMICONDUCTOR SURFACES; SILICIDATION;

NANOSTRUCTURED MATERIALS;

EID: 2942741367     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.079     Document Type: Conference Paper

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